Pulsed Laser Deposition System for Thin Films Growth of Oxides
The instrument can grow thin films of complex oxides using KrF excimer laser operating at 248 nm. The growth can be carried out at various combinations of pressure of oxygen in the vacuum chamber, laser repetition rate and energy as well as substrate temperature.
Contact Person
- Prof. Ashish Garg
Access procedure:
Contact Prof. Ashish Garg