सीएचई659ए - माइक्रो में प्रोसेस अभियांत्रिकी सिद्धांत। छलरचना

This course provides an insight into the process engineering principles in microelectronic fabrication. The transport processes, reaction kinetics and reactor design aspects of the following topics will be covered silicon crystal growth, oxidation, ion implantation, chemical and physical vapor deposition, rapid thermal processing, epitaxy, lithography, plasma processing (deposition and etch), electrochemical deposition and chemical mechanical planarization. Also, the cleanliness and purity in process environment (e.g. filtration, mechanisms of particulate deposition and removal on surfaces) will be covered.